National Repository of Grey Literature 2 records found  Search took 0.00 seconds. 
Preparation of Ag/Co/Ag Trilayers
Burda, Pavel ; Kolíbal, Miroslav (referee) ; Čechal, Jan (advisor)
The Bachelor's thesis is aimed to the preparation of silver and cobalt ultrathin films. The films are formed on modified surfaces of crystalline silicon substrates (SiO2/Si(111), Si(111) ?H, Si(111) 7×7) and amorphous SiO2 in a form of a quartz glass. Thin films are grown using an effusion cell for Molecular Beam Epitaxy (MBE). Surface modified surfaces are covered subsequently by a silver, cobalt and silver thin layer. The individual film thickness is 6 nm. Consequently the samples are studied by the X-ray Photoelectron Spectroscopy (XPS) and the Atomic Force Microscopy (AFM). The morphology of thin films and growth modes are compared among the substrates. Growth modes change with the surface modification type. Complete trilayer system Ag/Co/Ag was prepared on SiO2/Si(111) and Si(111) 7×7. Such system can be employed in plasmonics in order to allow the control of surface plasmon polariton properties by an external magnetic field.
Preparation of Ag/Co/Ag Trilayers
Burda, Pavel ; Kolíbal, Miroslav (referee) ; Čechal, Jan (advisor)
The Bachelor's thesis is aimed to the preparation of silver and cobalt ultrathin films. The films are formed on modified surfaces of crystalline silicon substrates (SiO2/Si(111), Si(111) ?H, Si(111) 7×7) and amorphous SiO2 in a form of a quartz glass. Thin films are grown using an effusion cell for Molecular Beam Epitaxy (MBE). Surface modified surfaces are covered subsequently by a silver, cobalt and silver thin layer. The individual film thickness is 6 nm. Consequently the samples are studied by the X-ray Photoelectron Spectroscopy (XPS) and the Atomic Force Microscopy (AFM). The morphology of thin films and growth modes are compared among the substrates. Growth modes change with the surface modification type. Complete trilayer system Ag/Co/Ag was prepared on SiO2/Si(111) and Si(111) 7×7. Such system can be employed in plasmonics in order to allow the control of surface plasmon polariton properties by an external magnetic field.

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